Archives for iOS Archives - Page 4 of 4 - Architosh
In-Depth: FileMaker Go and iPad scores big for AEC Industry
In this feature In-Depth article Architosh talks to FileMaker executives and a key FileMaker developer for Johnson Controls about why the new FileMaker Go 1.2 is a great tool for AEC professionals and how FileMaker offers iOS development a wonderful alternative to working with Objective-C
Autodesk Buzzsaw comes to Apple iPad and iPhone
Buzzsaw is one of Autodesk’s latest applications to move up on the iOS food chain and respond to market demand for iPad use. iPhone and iPad users can collaborate with peers and access critical project information using their smartphone or tablet
Apple may move to ARM architecture for Macs
Ironically Apple helped fund and establish ARM (Advanced RISC Machines) in the UK back at the time of the Apple Newton. Now with ARM based chips dominating both smartphones and tablet markets, it looks like Apple may once again move the entire industry to a new paradigm.
iPad 2: Impact on enterprise, engineering and CAD
iPad 2 stands to continue its dominance and transform opportunities in enterprise, engineering and CAD. Who wins, how and why? We asked Charles Edge to help us clarify the issues.
Apple’s graphics investment Imagination buys Caustic Graphics
Apple is likely to have the benefits of OpenRL based raytracing in future iOS devices like the next iPhone and next iPad, based on the recent investment by Imagination Technologies in Caustic Graphics.
AutoCAD WS 1.1 update announced
Autodesk announced yesterday at Autodesk University 2010, that an update to its AutoCAD WS application is coming soon. Version 1.1 will include significant new features, including the ability to work offline (without WiFi or cellular connection) and the ability to open files from an email attachment and then upload them to an AutoCAD WS account. […]
Mac Unit Growth Remains Impressive Despite iPad
Apple’s Mac units continue to climb at a healthy rate, but the iPad is having an affect, just not a big one yet.